Mass flow meter & controller | Mots-clé www.vacuum-guide.com |
leak detector residual gas analysis vacuum measurement vacuum components |
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BRONKHORST HIGH-TECH BV - www.bronkhorst.com
- Nijverheidsstraat 1A, 7261AK Ruurlo, Nederland email: info@bronkhorst.com, Tel. +31 573 4588 00 Bronkhorst High-Tech offers thermal and Coriolis mass flow meters and controllers for applications in laboratory and industry. The measuring range for these instruments can be selected between 0-1 mln/min and 0-10000 m3n/h for gases and 0-30 mg/h up to 0-600 kg/h for liquids. Bronkhorst also provides pressure controllers for 0-1.5 psi up to 0-6000 psi and innovative vapor dosage systems, e.g. for CVD applications. |
products: Mass Flow Meters and Controllers
Pressure Controllers, Evaporation Equipment (Vaporizers) |
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Brooks Instrument BV - www.brooksinstrument.com
- Neonstraat 3, 6718 WX Ede, Nederland email: BrooksEU@BrooksInstrument.com, Tel. +31 318 549300 World's largest installed base of mass flow controllers; one of the most trusted suppliers of mass flow technology to the global semiconductor industry. Brooks holds over 150 active patents, so our product portfolio incorporates multiple patented advances in fundamental fluid measurement and control technology. |
products: Metal Sealed Thermal Mass Flow Controllers & Meters
Highest-purity flow path. Ultra-precise, contaminant-free control. Many of today's advanced electronic device fabrication processes require extremely accurate and highly repeatable measurement and control of expensive ultra-pure gases and liquid precursors. Brooks Instrument meets those needs with our game-changing metal sealed thermal mass flow controllers and meters. Precise chemistry control is achieved through the combination of ultra-stable, highly accurate measurement sensors, fast precision control valves and powerful digital electronics. Purity of the process chemistry is ensured by our high-integrity (leak tight), ultra-high purity, all-metal wetted flow path, designed to keep outside contaminants like moisture and oxygen from corrupting the process media. |
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